Düse/Yttriumoxid (Y₂O₃) Keramikdüse | Plasmarresistente Düsen für die Halbleiterätzung
Düse/Yttriumoxid (Y₂O₃) Keramikdüse | Plasmarresistente Düsen für die Halbleiterätzung
Düse/Yttriumoxid (Y₂O₃) Keramikdüse | Plasmarresistente Düsen für die Halbleiterätzung
Düse/Yttriumoxid (Y₂O₃) Keramikdüse | Plasmarresistente Düsen für die Halbleiterätzung
Düse/Yttriumoxid (Y₂O₃) Keramikdüse | Plasmarresistente Düsen für die Halbleiterätzung
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Yttrium Oxide (Y₂O₃) Ceramic Nozzle | Plasma-Resistant Nozzles for Semiconductor Etching Equipment
Anpassung:
Available
Zahlungsbedingungen:
LC, T/T
OEM/ODM:
available
Beispiel:Kostenpflichtige UnterstützungProben erhalten
Produktdetails
FAQ
Wesentliche Details
Lieferzeit:1 month
Versand:快递
Spezifikationsnummer:SJ0010081
Produkteinführung

Yttrium Oxide (Y₂O₃) Ceramic Nozzle | Plasma-Resistant Nozzles for Semiconductor Etching Equipment


High-purity yttrium oxide ceramic nozzles with excellent plasma and corrosion resistance. Ideal for semiconductor etching and deposition systems.


  • yttrium oxide nozzle

  • Y2O3 ceramic nozzle

  • plasma resistant ceramic nozzle

  • semiconductor etching nozzle

  • high purity ceramic nozzle

  • corrosion resistant ceramic nozzle


Product Overview

Yttrium oxide (Y₂O₃) ceramic nozzles are high-performance components specifically designed for semiconductor plasma environments. With exceptional resistance to fluorine-based plasma corrosion and low particle generation, Y₂O₃ nozzles are widely used in etching and deposition equipment where material purity and durability are critical.

Compared to conventional ceramics such as alumina, yttrium oxide offers significantly improved plasma resistance, making it an ideal choice for extending component lifetime and maintaining process stability.


Key Features

1. Excellent Plasma Resistance
Outstanding resistance to fluorine-based plasma environments.

2. High Purity Material
Minimizes contamination in semiconductor processes.

3. Low Particle Generation
Ensures clean operation and improves yield.

4. Superior Corrosion Resistance
Performs reliably in aggressive chemical environments.

5. Extended Service Life
Reduces maintenance frequency and downtime.


Applications

  • Semiconductor etching equipment (dry etching systems)

  • Plasma-enhanced deposition systems (PECVD)

  • Gas distribution nozzles in process chambers

  • High-purity fluid delivery systems

  • Advanced semiconductor manufacturing tools


Technical Advantages

  • Improved process stability and yield

  • Reduced contamination risk in wafer fabrication

  • Longer component replacement cycles

  • Compatible with advanced semiconductor processes


Manufacturing Capability

  • High-purity Y₂O₃ ceramic forming

  • Precision machining of micro-holes and flow channels

  • Surface finishing for low roughness

  • Tight dimensional tolerance control

  • Cleanroom-compatible production


Customization Options

  • Nozzle geometry and dimensions

  • Micro-hole diameter and distribution

  • Surface finishing requirements

  • Purity levels of Y₂O₃ material

  • OEM production based on drawings


Localized Title (US)

Y₂O₃ Ceramic Nozzles for Semiconductor Etching | Plasma-Resistant Components Supplier in USA

Localized Content Snippet

We supply high-purity yttrium oxide ceramic nozzles across the United States for semiconductor plasma processing equipment. Our Y₂O₃ solutions ensure durability, cleanliness, and performance.

OEM customization and engineering support available.


🔹 CTA

  • Request a Y₂O₃ Nozzle Quote

  • Submit Your Process Requirements

  • Contact Our Engineering Team



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