Alumina Ceramic Parts for Ion Implantation Equipment | High Purity Semiconductor Components
High-purity alumina ceramic parts for ion implantation equipment. Excellent electrical insulation, thermal stability, and plasma resistance for semiconductor manufacturing environments.
alumina ceramic ion implantation parts
semiconductor ceramic components
ion implanter ceramic parts
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ceramic components for vacuum systems
plasma resistant ceramic parts
Product Overview
Alumina ceramic parts for ion implantation equipment are precision-engineered components used in semiconductor manufacturing systems. Made from high-purity alumina (Al₂O₃), these components provide excellent electrical insulation, thermal stability, and resistance to plasma and vacuum environments, ensuring reliable performance in advanced semiconductor processes.
Key Features
1. High Purity Alumina (≥99%)
Minimizes contamination and meets stringent semiconductor cleanliness standards.
2. Excellent Electrical Insulation
Supports stable operation in high-voltage ion implantation systems.
3. Plasma & Vacuum Compatibility
Resistant to plasma exposure and suitable for ultra-high vacuum environments.
4. Thermal Stability
Maintains dimensional stability under temperature fluctuations.
5. Low Particle Generation
Critical for maintaining wafer yield and process reliability.
Applications
Ion implantation systems
Semiconductor wafer processing equipment
Vacuum and plasma processing chambers
High-voltage insulation components
Precision semiconductor tooling
Technical Advantages
Non-metallic and non-magnetic material
High dielectric strength
Corrosion resistance under reactive environments
Suitable for cleanroom and semiconductor fabs
Customization Options
Complex geometries for equipment integration
High precision machining and tight tolerances
Surface finishing for low particle generation
Custom designs based on semiconductor equipment requirements
Localized Title (US)
Alumina Ceramic Parts for Ion Implantation Equipment | USA Semiconductor Supplier
Localized Content Snippet
We supply high-purity alumina ceramic components for ion implantation systems to semiconductor manufacturers across the United States. Our parts are designed for vacuum compatibility, plasma resistance, and precision performance in advanced wafer processing environments.
Engineering support and global delivery available.
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| Type | Unit | A‑100 | A‑200 | A‑300 | AZ‑100 |
| Material | - | Al₂O₃ 97% | Al₂O₃ 99.5% | Al₂O₃ 99.7% | Al₂O₃‑ZrO₂ |
| Colour | - | White ivory | White | Ivory White | White |
| Density | g/cm³ | 3.75 | 3.9 | 3.92 | 4.2 |
| Flexural Strength | MPa | 280 | 320 | 370 | 480 |
| Compressive Strength | MPa | 2250 | 2300 | 2450 | 2700 |
| Modules of Elasticity | GPa | 330 | 370 | 380 | 350 |
| Fracture Toughness | MPa·m^½ | 3 | 4 | 4.5 | 5.5 |
| Poisson's Ratio | — | 0.23 | 0.22 | 0.22 | 0.24 |
| Hardness | HRA | 90 | 91 | 91 | 91 |
| Vickers Hardness | HV1 | 1450 | 1550 | 1600 | 1600 |
| Thermal Expansion | 10⁻⁶K⁻¹ | 7.1 | 6.8 | 6.8 | 9.2 |
| Thermal Conductivity | W/m·K | 25 | 32 | 32 | 8 |
| Thermal Shock | ΔT·℃ | 200 | 220 | 220 | 470 |
| Max Use Temp(Oxidizing) | ℃ | 1200 | 1400 | 1650 | 1000 |
| Max Use Temp(Reducing) | ℃ | 1200 | 1400 | 1700 | 1000 |
| Volume Resistivity (20℃) | Ω·cm | 10¹⁴ | 10¹⁵ | 10¹⁵ | 10¹⁴ |
| Dielectric Strength | kV/mm | 16 | 20 | 22 | 16.5 |
| Dielectric Constant(1MHz) | - | 11.5 | 11 | 10 | 11 |
| Dielectric Loss (tanδ) | 1MHz | 3×10⁻³ | 1×10⁻³ | 1×10⁻³ | 2×10⁻² |