Silicon Carbide Ceramic Wafer Vacuum Chuck | High Precision SiC Wafer Holding Solutions
Silicon Carbide Ceramic Wafer Vacuum Chuck | High Precision SiC Wafer Holding Solutions
Silicon Carbide Ceramic Wafer Vacuum Chuck | High Precision SiC Wafer Holding Solutions
Silicon Carbide Ceramic Wafer Vacuum Chuck | High Precision SiC Wafer Holding Solutions
Silicon Carbide Ceramic Wafer Vacuum Chuck | High Precision SiC Wafer Holding Solutions
Silicon Carbide Ceramic Wafer Vacuum Chuck | High Precision SiC Wafer Holding Solutions
Silicon Carbide Ceramic Wafer Vacuum Chuck | High Precision SiC Wafer Holding Solutions
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Silicon Carbide Ceramic Wafer Vacuum Chuck | High Precision SiC Wafer Holding Solutions
Customization:
Available
Terms of Payment:
LC, T/T
OEM/ODM:
available
Specification:
Product details
Attachments
FAQ
Essential details
Shipping:Express delivery
Specification Number:SN0010052
Product Introduction

Silicon Carbide Ceramic Wafer Vacuum Chuck | High Precision SiC Wafer Holding Solutions


Silicon carbide (SiC) ceramic vacuum chucks for wafer handling and processing. High stiffness, thermal stability, and low particle generation for semiconductor applications.


  • silicon carbide wafer chuck

  • SiC ceramic vacuum chuck

  • wafer vacuum suction plate

  • semiconductor wafer chuck ceramic

  • high precision wafer holding chuck

  • SiC vacuum chuck semiconductor


Product Overview

The silicon carbide (SiC) ceramic wafer vacuum chuck is a high-precision component designed for wafer handling, positioning, and processing in semiconductor manufacturing. With exceptional stiffness, thermal stability, and low particle generation, SiC vacuum chucks ensure secure wafer fixation and high-accuracy processing in cleanroom environments.


Key Features

1. High Rigidity & Strength
Silicon carbide provides excellent stiffness, ensuring stable wafer support.

2. Precision Vacuum Adsorption
Uniform suction distribution for secure and accurate wafer positioning.

3. Excellent Thermal Stability
Maintains dimensional accuracy under temperature variation.

4. Low Particle Generation
Ideal for contamination-sensitive semiconductor processes.

5. High Flatness & Surface Accuracy
Ensures consistent wafer contact and processing precision.


Applications

  • Semiconductor wafer processing equipment

  • Lithography and etching systems

  • CMP (Chemical Mechanical Planarization) equipment

  • Wafer inspection and metrology tools

  • Vacuum handling systems


Technical Advantages

  • Improved wafer handling accuracy

  • Reduced vibration and deformation

  • Stable performance in high-temperature environments

  • Long service life under high-cycle operation


Customization Options

  • Chuck diameter and thickness

  • Vacuum hole pattern design

  • Surface flatness and roughness control

  • Integration with equipment systems

  • OEM production based on drawings


Localized Title (US)

Silicon Carbide Wafer Vacuum Chucks | Precision Semiconductor Components Supplier in USA

Localized Content Snippet

We supply high-precision silicon carbide ceramic wafer vacuum chucks across the United States. Our SiC components provide excellent rigidity, thermal stability, and reliable wafer handling for semiconductor manufacturing.

OEM customization and engineering support available.


🔹 CTA

  • Request a Custom Wafer Chuck Quote

  • Submit Your Wafer Specifications

  • Contact Our Engineering Team



Material characteristic

Type
SC‑200
XY Grade
SC-200
Material
SiC
Colour
Blue Black
Density
3.15
Flexural Strength
1100
Compressive Strength
2300
Modules of Elasticity
220
Fracture Toughness
7
Poisson's Ratio
0.3
Hardness
90
Vickers Hardness
1450
Thermal Expansion
4.5
Thermal Conductivity
100
Thermal Shock
400
Max Use Temp (Oxidizing)
1400
Max Use Temp (Reducing)
1650
Volume Resistivity (20℃)
10⁵
Dielectric Strength
0
Dielectric Constant (1MHz)

Dielectric Loss (tanδ)

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